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Cold-mixed resin

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Cold-stained resin: is commonly used in the protection of samples from heat and pressure. The sample is fast and stable.

Product Advantages

✪The properties of stable, stable, low-breeding, long-term storage of non-change colour, high hardness, and altrate-resistant properties, are at room temperature.

✪Tasteless, fast-determining, surface flat, high transparency, no bubbles, low viscosity, good permeability, low heat and low contraction.

✪The pressure pot or vacuum mosaicer is better.

Technical Specifications
Product NameModelCharacteristicsColoursSolidification requires temperature and timeTemperature limitStink hardnessGroupMatchPackaging&Volume RatioPyrotechnicsApplication area
Cold-molecated resin211002800The Yaklisi system, high hardness, high transparency, and the pressure glyc resin are usually used for rapid stabilization or require large sample preparation requirements.Transparent25°C &10-15 minutesMaximum 100°C90Powder/Low10:081000g+800ml&2000g+1600ml   2：1In the pressure pan.High transparency, good mobility and permeability apply particularly to PCB and other electronic components.
Cold-molecated resin2110028000UV resin, high hardness, high transparency, time-appropriate adjustment for photo-conservation.Transparent25°CMax. 80°C90Liquid/1000ml UV photo fixerHigh transparency, good mobility and permeability apply particularly to PCB and other electronic components.
Cold-molecated resin2110028000The power is extremely good for electrolysis or electrolysis of photocorrosion.Transparent25°C&Ten minutes.Max. 80°C90Powder/Low/1000ml+500g 2：1UV photo fixerHigh transparency, good mobility and permeability apply particularly to PCB and other electronic components.
Cold-molecated resin211003500Ethylene resins, rapid solidification, general mobility, environmental protection, provision of better chemical properties, adhesiveness, low constrictiveness and high transparency, with better marginal resolution.Transparent Yellow25°C&25-40 minutesMax. 110°C84Liquid/liquid2:011000ml+500ml 2：1In the pressure pan.Suture-free mosaics, such as casting iron, steel, copper, copper alloy, aluminium and aluminium alloy, nickel-based alloy, titanium and titanium alloy, hard-quality alloy, which are used primarily in metal samples, and are particularly suitable for those samples with fast-form requirements
Cold-molecated resin211004300Ethylene resins, rapid solidification, high mobility, environmental protection, better chemical properties, adhesiveness, low constrictiveness and high transparency, with better marginal resolution.High Transparency25°C&3-4 hoursMax. 80°C80Liquid/liquid4:031000ml+300ml 10：3Pressure pan/vacuum mosserThe seamlessly embedded metal samples are used primarily for pore, micro-pore, multi-layered metal samples. These are found in casting iron, steel, copper, copper alloy, aluminium and aluminium alloy, nickel-based alloy, titanium and titanium alloy, hard alloy, heat spray, metal plating, etc.
Cold-molecated resin2110043000Ethylene resins, rapid solidification, high mobility, environmental protection, better chemical properties, adhesiveness, low constrictiveness and high transparency, with better marginal resolution.High Transparency25°C&6-8 hoursMax. 70°C80Liquid/liquid4:031000ml+300ml 10：3Pressure pan/vacuum mosserThe seamlessly embedded metal samples are used primarily for pore, micro-pore, multi-layered metal samples. These are found in casting iron, steel, copper, copper alloy, aluminium and aluminium alloy, nickel-based alloy, titanium and titanium alloy, hard alloy, heat spray, metal plating, etc.
Cold-molecated resin211005300Ethylene resins, low constriction, low heat, no odour, excellent mobility.Transparent Blue25°C&20-24 hoursMax. 50°C79Liquid/liquid1000ml+300ml 10：3Pressure pan/vacuum mosserComing temperatures below 90 degrees are used in the heat-sensitive material industry, such as semiconductors, microelectronics, medicine, photovoltaics, micro-sizes.
Cold-molecated resin211006050Polyester resins, efficient solidification, super-high transparency, rapid testing requirements, and good polishing photolysis performance.High Transparency25°C&20-30 minutesMax. 115°C79Liquid/liquid1000ml+50ml 100：1.8In the pressure pan.It's necessary to have a transparent and clear mosaic, and the samples need to be fast mosaic.
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